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Start Over Creator Navrátil, Karel

2. Vývoj zařízení k in situ stanovení rozložení tlouštěk vrstev pomocí UV-VIS zobrazovací reflektometrie

Creator:
Spousta, Jiří, Urbánek, Michal, Chmelík, Radim, Běhounek, Tomáš, Plšek, Radek, Šikola, Tomáš, and Navrátil, Karel
Format:
bez média and svazek
Type:
model:article and TEXT
Language:
Czech
Description:
A new optical apparatus for in situ monitoring of optical constants of growing (etched) thin films - substrate systems over the large surface area of the sample (ranging from 1 to 2 cm2) was designed, constructed and tested in our group. Namely, the two following devices have been designed: Firstly, InSitu-AreaSampler together with control software has been developed for analysis of an areal homogeneity of thin-film growth during its deposition (or etching). The method is based on the measurement of reflectivity of the sample at selected wavelengths of an incident light. Areal detection is assured (performed) by imaging of the surface of thin film by a CCD chip where each pixel acts as small detector in an independent way. Secondly, the InSitu-SpotSampler was developed for measurement the reflectivity of growing (etched) thin film at one spot on the sample surface but in quasi-continual range of wavelengths (UV-VIS). The results achieved show the usability of this instrument for the in situ measurements of optical constants (index of refraction n, exctinction coefficient k, thickness d) over the whole sample area (cca 1.5 × 1.5 cm2) in a quasi-real time mode. Having this feed-back it is possible to control the deposition process in a more effective way.
Rights:
http://creativecommons.org/licenses/by-nc-sa/4.0/ and policy:public